TY - GEN
T1 - Investigation of the use of rotating linearly polarized light for characterizing SiO2 thin-film on Si substrate
AU - Pawong, C.
AU - Chitaree, R.
AU - Soankwan, C.
PY - 2011
Y1 - 2011
N2 - This research is based on the Fresnel's equations and the ellipsometric technique that investigate the sample of SiO2 thinfilm on Si substrate. The investigation is made by a probing beam which is in the form of a rotating linearly polarized light generated by the polarizing Mach-Zehnder interferometer (pMZi). The detection of the changed polarization states of the incident light due to reflection on the sample surfaces led to a set of unique characteristics describing a thin-film substrate system in terms of ellipsometric parameters ψ and Δ. SiO2 thin-films were chosen to study because of their well known characteristics. The accuracy of measurements was confirmed by comparisons to calculated values derived from Fresnel's equations and a standard instrument. The results clearly reveal a feasibility of using the rotating linearly polarized light produced by pMZi for a non-destructive characterization of the thin-film system.
AB - This research is based on the Fresnel's equations and the ellipsometric technique that investigate the sample of SiO2 thinfilm on Si substrate. The investigation is made by a probing beam which is in the form of a rotating linearly polarized light generated by the polarizing Mach-Zehnder interferometer (pMZi). The detection of the changed polarization states of the incident light due to reflection on the sample surfaces led to a set of unique characteristics describing a thin-film substrate system in terms of ellipsometric parameters ψ and Δ. SiO2 thin-films were chosen to study because of their well known characteristics. The accuracy of measurements was confirmed by comparisons to calculated values derived from Fresnel's equations and a standard instrument. The results clearly reveal a feasibility of using the rotating linearly polarized light produced by pMZi for a non-destructive characterization of the thin-film system.
KW - Ellipsometric parameters
KW - Ellipsometric technique
KW - Polarizing mach- zehnder interferometer.
KW - Rotating linearly polarized light
UR - https://www.scopus.com/pages/publications/84893707164
M3 - Conference contribution
AN - SCOPUS:84893707164
SN - 9780819489555
T3 - Optics InfoBase Conference Papers
BT - Asia Communications and Photonics Conference and Exhibition, ACP 2011
T2 - Asia Communications and Photonics Conference and Exhibition, ACP 2011
Y2 - 13 November 2011 through 16 November 2011
ER -